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Fraun­ho­fer-Insti­tut für Pho­to­ni­sche Mikro­sys­teme IPMS

Das Fraun­ho­fer-Insti­tut für Pho­to­ni­sche Mikro­sys­teme ist eines von 72 Insti­tu­ten der Fraun­ho­fer-Gesell­schaft, einer der füh­ren­den Orga­ni­sa­tio­nen für ange­wandte For­schung in Europa.

Bache­lor-/Mas­ter-/Diplom the­sis work: Nano­st­ruc­tu­ring for inte­gra­ted cir­cuit app­li­ca­ti­ons (IPMS-2019-111)

Auf­ga­ben­be­sch­rei­bung:

Star­ting from 01.09.2019 an exci­ting stu­dent posi­tion in the field of litho­gra­phic nano­st­ruc­tu­ring is avail­able. Micro- and Nano­st­ruc­tu­ring plays an essen­tial role in the semi­con­duc­tor manu­fac­tu­ring pro­cess. It implies both litho­gra­phy and etch pro­ces­ses which are inter­de­pen­dent and should be pre­cisely opti­mi­sed for each spe­ci­fic app­li­ca­tion.

The focus of a cur­rent pro­ject will be nano­st­ruc­tu­ring for inter­con­nects in the 22 FDX tech­no­logy. The smal­lest distance requi­red by this app­li­ca­tion is around 40 nm. This dimen­sion is not direc­tly reach­a­ble by the 193 nm immer­sion litho­gra­phy used in the semi­con­duc­tor found­ries. Hence alter­na­tive approa­ches should be app­lied, as well as litho­gra­phy and etch pro­ces­ses should be deve­lo­ped and opti­mi­sed. At Fraun­ho­fer IPMS e-beam litho­gra­phy is used for inves­ti­ga­tion pur­po­ses due to its fle­xi­bi­lity.

The tasks of the cur­rent the­sis are:
  • Deve­lop­ment and adjust­ment of e-beam litho­gra­phy pro­ces­ses for dif­fe­rent stacks, which are rele­vant for 22 FDX tech­no­logy
  • Lay­out data pre­pa­ra­tion for e-beam expo­sure
  • Inves­ti­ga­tion of the pro­cess win­dow (varia­tion of the pro­cess para­me­ters, such as resist thic­k­ness and resist bake tem­pe­ra­ture)
  • Cha­rac­te­ri­sa­tion of the resul­ting nano­st­ruc­tures using mainly CD-SEM (alter­na­tively cross sec­tion SEM, AFM) and eva­lua­tion of the mea­su­rement results

Er­war­te­te Qua­li­fi­ka­tio­nen:

  • You already finis­hed or due to finish your Bache­lor degree in phy­sics, che­mi­stry, elec­tri­cal engi­nee­ring or mate­rial sci­ence
  • You have gai­ned good know­ledge in the area of semi­con­duc­tor manu­fac­tu­ring pro­ces­ses, ide­ally litho­gra­phy
  • You are able to handle and eva­luate large amounts of mea­su­rement data (in Excel, Ori­gin or Mat­lab)
  • Ide­ally you have already some expe­ri­ence of working in the lab with orga­nic che­mi­cals
  • Flu­ent Eng­lish

Un­ser An­ge­bot:

We offer an exci­ting, up-to-date gra­duate posi­tion in which you can bene­fit from our expe­ri­en­ced team. Our excel­lent indus­try-rela­ted rese­arch and deve­lop­ment infra­st­ruc­ture pro­vi­des you access to a large net­work of experts. You will become part of an inspi­ra­tio­nal inter­na­tio­nal work envi­ron­ment based on trust, crea­ti­vity and team spi­rit. Fur­ther, we offer oppor­tu­nities for your fur­ther pro­fes­sio­nal career.

The posi­tion is initi­ally limi­ted for 6 - 12 mon­ths.
In case of iden­ti­cal qua­li­fi­ca­ti­ons pre­fe­rence will be given to severely dis­ab­led can­di­da­tes. We would like to point out that the cho­sen job title also inclu­des the third gen­der. The Fraun­ho­fer-Gesell­schaft empha­si­ses gen­der-inde­pen­dent pro­fes­sio­nal equa­lity.

We at the Fraun­ho­fer IPMS deve­lop elec­tro­nic, mecha­ni­cal and opti­cal com­pon­ents and work on their inte­gra­tion into minia­tu­ri­zed modu­les and sys­tems. We aim for custo­mers who want to increase the func­tio­n­a­lity of their pro­ducts by use of micro­sys­tems (MEMS, MOEMS, CMOS) with inno­va­tive fea­tures and smal­ler dimen­si­ons.